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Ç¥ÁعøÈ£ | TTAK.KO-10.0574 | ±¸Ç¥ÁعøÈ£ | |
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Á¦°³Á¤ÀÏ | 2012-10-09 | ÃÑÆäÀÌÁö | 18 |
ÇѱÛÇ¥Áظí | ¹ÝµµÃ¼ µµ±Ý ÀåÄ¡ÀÇ ¸ðµ¨¸í Ç¥±â¹ý | ||
¿µ¹®Ç¥Áظí | Marking Method of Model Name for Semiconductor Plating System | ||
Çѱ۳»¿ë¿ä¾à | µµ±Ý Àåºñ ¸ðµ¨ Ç¥±â¹ýÀ» Ç¥ÁØÈÇÏ¿© ¸ðµ¨¸í¿¡ Àåºñ¿¡¼ Àΰ¡ÇÒ ¼ö ÀÖ´Â Á÷·ùÀü¿øÀÇ Á¾·ù¸¦ Á¦°øÇÔÀ¸·Î ½á Àåºñ ±¸¸Å½Ã¿¡´Â Á¤È®ÇÏ°í ºü¸£°Ô Àåºñ¸¦ ¼±ÅÃÇÒ ¼ö ÀÖ°Ô Çϸç Àåºñ »ç¿ë ½Ã¿¡´Â Àû ¿ëÇÒ Àü·ù Á¾·ù¸¦ ºü¸£°Ô ¼±ÅÃÇÒ ¼ö ÀÖ´Â ¹æ¹ýÀ» Á¦°øÇÏ°íÀÚ ÇÑ´Ù. | ||
¿µ¹®³»¿ë¿ä¾à | This standard offer the guide line of marking method of model name of semiconductor plating system for finding right wanted direct currents easily. | ||
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°ü·ÃÆÄÀÏ | TTAK_KO-10_0574.pdf |
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