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¿µ¹®Ç¥Áظí Marking Method of Model Name for Semiconductor Plating System
Çѱ۳»¿ë¿ä¾à µµ±Ý Àåºñ ¸ðµ¨ Ç¥±â¹ýÀ» Ç¥ÁØÈ­ÇÏ¿© ¸ðµ¨¸í¿¡ Àåºñ¿¡¼­ Àΰ¡ÇÒ ¼ö ÀÖ´Â Á÷·ùÀü¿øÀÇ Á¾·ù¸¦ Á¦°øÇÔÀ¸·Î ½á Àåºñ ±¸¸Å½Ã¿¡´Â Á¤È®ÇÏ°í ºü¸£°Ô Àåºñ¸¦ ¼±ÅÃÇÒ ¼ö ÀÖ°Ô Çϸç Àåºñ »ç¿ë ½Ã¿¡´Â Àû ¿ëÇÒ Àü·ù Á¾·ù¸¦ ºü¸£°Ô ¼±ÅÃÇÒ ¼ö ÀÖ´Â ¹æ¹ýÀ» Á¦°øÇÏ°íÀÚ ÇÑ´Ù.
¿µ¹®³»¿ë¿ä¾à This standard offer the guide line of marking method of model name of semiconductor plating system for finding right wanted direct currents easily.
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