Ç¥ÁØÈ­ Âü¿©¾È³»

TTAÀÇ Ç¥ÁØÇöȲ

Ȩ > Ç¥ÁØÈ­ °³¿ä > TTAÀÇ Ç¥ÁØÇöȲ

Ç¥ÁعøÈ£ TTAK.KO-10.0574 ±¸Ç¥ÁعøÈ£
Á¦°³Á¤ÀÏ 2012-10-09 ÃÑÆäÀÌÁö 18
ÇѱÛÇ¥ÁØ¸í ¹ÝµµÃ¼ µµ±Ý ÀåÄ¡ÀÇ ¸ðµ¨¸í Ç¥±â¹ý
¿µ¹®Ç¥Áظí Marking Method of Model Name for Semiconductor Plating System
Çѱ۳»¿ë¿ä¾à µµ±Ý Àåºñ ¸ðµ¨ Ç¥±â¹ýÀ» Ç¥ÁØÈ­ÇÏ¿© ¸ðµ¨¸í¿¡ Àåºñ¿¡¼­ Àΰ¡ÇÒ ¼ö ÀÖ´Â Á÷·ùÀü¿øÀÇ Á¾·ù¸¦ Á¦°øÇÔÀ¸·Î ½á Àåºñ ±¸¸Å½Ã¿¡´Â Á¤È®ÇÏ°í ºü¸£°Ô Àåºñ¸¦ ¼±ÅÃÇÒ ¼ö ÀÖ°Ô Çϸç Àåºñ »ç¿ë ½Ã¿¡´Â Àû ¿ëÇÒ Àü·ù Á¾·ù¸¦ ºü¸£°Ô ¼±ÅÃÇÒ ¼ö ÀÖ´Â ¹æ¹ýÀ» Á¦°øÇÏ°íÀÚ ÇÑ´Ù.
¿µ¹®³»¿ë¿ä¾à This standard offer the guide line of marking method of model name of semiconductor plating system for finding right wanted direct currents easily.
±¹Á¦Ç¥ÁØ
°ü·ÃÆÄÀÏ TTAK_KO-10_0574.pdf TTAK_KO-10_0574.pdf            

ÀÌÀü
ÀüÀÚȸ·Î¸¦ Æ÷ÇÔÇÏ´Â 3D ÇÁ¸°Æà Ãâ·Â¹°À» À§ÇÑ µ¥ÀÌÅÍ ÆÄÀÏÆ÷¸Ë
´ÙÀ½
½º¸¶Æ® Ȩ ¼­ºñ½º¸¦ À§ÇÑ º¸¾È ¿ä±¸»çÇ×